• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    1. Electron beam engraving process for producing screen pinholes of different size in a printing block surface, in which the screen pinholes are produced by the action of a defocusable electron beam aimed at the surface, which in the operative position is focussed on or in the immediate vicinity of the surface, characterised in that apart from the period of action and the focus location, the scale of reproduction of the charge carrier source on the printing block surface (4) is controlled at the same time as a function of tonal value.
    公开号:SU1452471A3
    申请号:SU823496070
    申请日:1982-09-28
    公开日:1989-01-15
    发明作者:Байсвенгер Зигфрид
    申请人:Др-Инж. Рудольф Хелль Гмбх (Фирма)；
    IPC主号:
    专利说明:


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    The invention relates to printing equipment for engraving printing plates and can be used in other fields of technology for welding, drilling, engraving and heating with an electron beam.
    The purpose of the invention is to ensure the stability of engraving.
    FIG. 1 shows a diagram of an apparatus for carrying out the method; in fig. 2 and 3 are an engraving diagram and a plot of the density distribution of the beam during engraving of large scanned cells; in FIG. 4 and 5 - the same, when engraving small raster cells.
    . The electron beam engraving device of raster cells of various sizes on the surface of the printing form contains (Fig. 1) long-focus lenses I, 2 and 3 and an aperture diaphragm 4 placed along the electron beam between the source 5 of the electrons and the printing form 6. In lenses 1 and 3 placed dynamic lenses 7 and 8.
    The method is implemented as follows. When the lens 7 is excited, the distance from the first long-focal lens 1 changes by a small amount. The scale of the image of the combination of lenses 1 and 7 also changes by a small amount. Since the image of electron source 5 using a combination of lenses 1 and 7 represents the object of the second short focus lens 2, a slight axial displacement of the first intermediate image leads to a large change in the scale of the image of lens 2. The scale of the image of the combination of lenses 3 and 8 changes for shifting the second intermediate image by a small amount. The resulting error in the position of the focus on the surface of the printing plate 6 can be compensated by adjusting the dynamic lens 8.. Example. If lens 1 is reduced threefold and lens 7 is not excited, then the second short-focus lens 2 can be adjusted so that it forms an image scale of 1. If lens 3 then forms an image scale of 4, then the total reduction is 12. FIG. I The resulting beam path is shown in solid lines. If the excite is now placed in the lens
    0


    1, lens 7, the first intermediate image becomes closer to the combination of lenses 1 and 7. At the same time, the distance of the second short-focus lens 2 from the object becomes longer. This means that the short focus lens 2 now has, with constant excitation, an image scale of, for example, equal to 3. The overall scale of the reduction of the device has changed as a result to 36. The resulting beam path is shown in FIG. 1 dotted line.
    If an aperture diaphragm 4 is located behind the short-focus lens 2, the image scale is modulated as well as the energy of the radiation is modulated. Because of this, both small and large cells can be engraved with almost the same power density.
    The focusing conditions at the point of exposure are shown for large cells in FIG. 2 and 3; for small cells, in FIG. 4 and 5.
    FIG. 3 and 5 are designated: L - radiation power density; g is the radius at the point of impact. Figures 2 to 5 give dimensions as approximate data.
    The invention provides very fast zooming of the image. The adjustment time during the transition from a strong to a weak decrease and vice versa is approximately 1 MKC.
    Form
    la invention
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    1. The method of electron beam engraving of raster cells of various sizes on the surface of the printing form, which means that the raster cells are made by acting on the surface of the defocused electron beam that is constantly directed to the surface, amplify it in the surface area and regulate the duration of its effect, characterized in that , in order to ensure the stability of engraving, simultaneously with the focusing, adjust the scale of the image of the source of charged particles on the surface of the printing form, depending on ti from a given tone gradation, and the image size of the source of the charge is female ////////////
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    权利要求:
    Claims (3)
    [1]
    Claim
    1. The method of engraving an electron beam of raster cells of various sizes on the surface of the printing form, which consists in the fact that the raster cells are made by exposure to a defocused electron beam constantly directed to the surface, focus it in the surface area and adjust the duration of its exposure, characterized in that, In order to ensure the stability of engraving, simultaneously with focusing, they regulate the image scale of the source of charged particles on the surface of the printing form, depending m predetermined tone gradation, the size of the particle source zaryazhen3 puff adjusted in proportion to a raster cell.
    [2]
    2. The method according to π. 1, characterized in that the rays distant from the axis are diaphragmed until an almost rectangular distribution of power density is obtained for both large and small raster cells.
    [3]
    3. A device for engraving with an electron beam raster cells of various sizes on the surface of a printing form, containing a source of electrons and the main lens system located in the direction of the electron beam, characterized in that in order to ensure the engraving stability, it is provided with at least two additional lens systems and aperture diaphragm, with additional lens systems 10 and aperture diaphragm placed sequentially in the direction of the electron beam between the electron source and the main th lens system. .
    Figure 1
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    类似技术:
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    JPH0314219A|1991-01-22|Electron beam lithography device
    JPS59178719A|1984-10-11|Electron beam annealing method and the apparatus therefor
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    同族专利:
    公开号 | 公开日
    DD204180A5|1983-11-16|
    AT24985T|1987-01-15|
    DK444082A|1983-04-11|
    JPS6255987B2|1987-11-24|
    EP0076868A1|1983-04-20|
    EP0076868B1|1987-01-14|
    US4471205A|1984-09-11|
    DE3175839D1|1987-02-19|
    JPS5872450A|1983-04-30|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    NL268860A|1959-04-17|
    DE2111628A1|1971-03-11|1972-09-14|Gruner & Jahr|Relief printing plates - or cylinders engraved by use of an electron beam|
    DE2458370C2|1974-12-10|1984-05-10|Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel|Energy beam engraving process and equipment for its implementation|
    JPS5283177A|1975-12-31|1977-07-11|Fujitsu Ltd|Electron beam exposure device|
    DE2752598C3|1977-11-25|1981-10-15|Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel|Method for operating an electromagnetic focusing electron-optical lens arrangement and lens arrangement therefor|
    US4243866A|1979-01-11|1981-01-06|International Business Machines Corporation|Method and apparatus for forming a variable size electron beam|
    DE3008176C2|1979-03-07|1986-02-20|Crosfield Electronics Ltd., London|Engraving of printing cylinders|
    DE2947444C2|1979-11-24|1983-12-08|Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel|Electron beam engraving process|DE4102983A1|1990-09-28|1992-04-02|Linotype Ag|SURFACE STRUCTURE OF A ROLLER AND METHOD AND DEVICE FOR PRODUCING THE SURFACE STRUCTURE|
    DE4031547A1|1990-10-05|1992-04-09|Hell Rudolf Dr Ing Gmbh|METHOD AND DEVICE FOR PRODUCING TEXTURE ROLLERS|
    DE4039105C2|1990-12-07|1994-12-08|Roland Man Druckmasch|Device for the pictorial description of a printing form|
    DE19624131A1|1996-06-17|1997-12-18|Giesecke & Devrient Gmbh|Process for the production of embossing plates|
    US20060249491A1|1999-09-01|2006-11-09|Hell Gravure Systems Gmbh|Laser radiation source|
    DE10058990C2|2000-11-28|2003-03-06|Heidelberger Druckmasch Ag|Device for irradiating an object for recording a visual product|
    DE102004023021B4|2004-05-06|2009-11-12|Pro-Beam Ag & Co. Kgaa|Method for ablative processing of surface areas|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    EP19810108156|EP0076868B1|1981-10-10|1981-10-10|Electron beam engraving method and apparatus for carrying it out|
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